Electron-Beam Writer Raith eLINE Plus
The Raith eLINE Plus is a modularly expandable tool for advanced electron-beam lithography. It enables tailored fabrication of nano- and microstructures as well as ultra-high resolution imaging. Stitch-free fabrication of structures with dimensions of few tens of nanometers in arrays of up to 90 millimeters is possible with high reproducibility.
Our experimental achieved minimum feature size on SiOx for a thin liftoff metallization process is around 5 nm. Unique features of the system are: up to 27 mm variation along the z-coordinate; a 4 inch laser interferometer stage for movement and pattern placement in the nm range; a thermal field emission filament for ultrahigh resolution in all operation modes; tunable electron energy for damage-free imaging; and range of detectors, e.g. Everhart Thornley SE detector, InLens SE detector and angle selective BSE detector.
For more information please contact Stefan Kauschke.
