MARCH reactive ion etching system

The MARCH reactive ion etcher 1701 is equipped with a 13.56 MHz RF generator with an automatic matching network enabling excellent process repeatability. The system can accommodate a wide range of process gases, including Ar, O2, H2 forming gas, He, CF4, and SF6. Currently it is setup for argon and oxygen only. Due to its high power (up to 600 W) the system can be used to etch various kinds of materials, including metals, e.g. gold. Contact: Dr. Mehran Mehrabanian.