The NanoFab Center at the IMSEAM Heidelberg is a micro- and nanofabrication facility offering access to two-photon laser printing devices. In our facility, we operate two Nanoscribe Photonic Professional GT2, which are located in and outside the cleanroom at the IMSEAM, respectively. The devices enable the two-photon laser printing of photopolymerizable resists with a wavelength of 780 nm. They allow for precise nano- (down to 200 nm spatial resolution), micro-, and mesoscale fabrication in the range of millimeter depending on the objective used for printing (10x, 20x, 25x, 63x). Our expertise on 3D microprinting is strongly connected to the research groups of Prof. Dr. Blasco and Prof. Dr. Selhuber-Unkel, who maintain and manage these devices. Please contact one of these groups for more information.
